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Gas flow technology is designed to easily apply for various nitride semiconductors because it has the gas delivery system in which MFCs, EPCs, and valves, etc. are well assembled each other. Therefore, it features no dead volume, fast response rate, convenience maintenance and modularity.
Gas injection head(Shower head) is designed to minimize particle generation by reduction of gas-phase reaction and to uniformly inject precursors onto wafers, leading to high quality and high uniformity of
thin film without wafer rotation on its own axis. The surface of gas injection head is processed by E.P.(Electro-polishing) treatments in order to be suitable for the growth of high-composition AlGaN layer.
It can be used without any routine maintenance for a long time because it is manufactured by well-guaranteed process technology.


The SYSNEX proprietary induction heating technology adopts a unique heating concept using optimally designed induction coils and a heated susceptor. This gives the Marvel series a marvelous temperature uniformity. This unique heating approach sets SYSNEX apart from other III-Nitrides MOCVD manufacturers. This technology was developed through countless experiments and simulation results.
¡á Fast and accurate temperature control
¡á Long lifetime of heating system
¡á Easy setup and maintenance
¡á Excellent temperature uniformity
....less than ¡¾2¡É at 1000¡É(each wafer pockets)


Susceptor Heat & Cooling Rate Specification
- Heating Time ¡Â 2min (From 450 ¡ÆC to 1000 ¡ÆC)
- Cooling Time ¡Â 3min (From 1000 ¡ÆC to 450 ¡ÆC)
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